Featured Research

from universities, journals, and other organizations

Making A Good Impression: Nanoimprint Lithography Tests

Date:
May 2, 2008
Source:
National Institute of Standards and Technology
Summary:
In what should be good news for integrated circuit manufacturers, recent studies have helped resolve two important questions about an emerging microcircuit manufacturing technology called nanoimprint lithography.

Electron micrograph shows a cross-section of a typical SOG microcircuit feature. Nanoporous regions in the interior are lighter. The process forms a dense, stronger skin about 2 nanometers thick on the outside. (Color added for clarity.)
Credit: NIST

In what should be good news for integrated circuit manufacturers, recent studies by the National Institute of Standards and Technology (NIST) have helped resolve two important questions about an emerging microcircuit manufacturing technology called nanoimprint lithography--yes, it can accurately stamp delicate insulating structures on advanced microchips, and, no, it doesn't damage them, in fact it makes them better.

Related Articles


An emerging manufacturing technique, nanoimprint lithography (NIL) is basically an embossing process. A stamp with a nanoscale pattern in its surface is pressed into a soft film on the surface of a semiconductor wafer. The film is hardened, usually by heating or exposure to ultraviolet light, and the film retains the impressed pattern from the stamp. The process is astonishingly accurate. NIL has been used to create features as small as ten nanometers across with relatively complex shapes.

NIL is being eyed in particular for building the complexly patterned insulating layers sandwiched between layers of logic devices in future generations of integrated circuits. State-of-the-art semiconductors contain over a billion transistors, packed together into a footprint of silicon that is no bigger than a few square centimeters. Several miles of nanoscale copper wiring are required to connect the devices, and these wires must be separated by a highly efficient insulator.

One candidate is a porous glassy material called SOG* that can be applied as a thin fluid film. When heated, SOG turns into a thin glass film laced with nanometer pores that enhance the electrical insulation. But SOG is relatively delicate, and the conventional photoresist etching process used to cut trenches for the wiring can compromise it. NIL, on the other hand, might be able to pattern SOG layers with wiring trenches and eliminate several time-consuming and expensive photolithography steps if it could pattern the film accurately and do so without destroying the delicate nanopore lacework.

In a paper published last fall,** NIST materials scientists addressed the first question. Using sensitive X-ray measurements they demonstrated that NIL could be used on a functional SOG material to transfer patterns with details finer than 100 nanometers with minimal distortion due to the processing. In a new paper this month,*** they extend this work to study the effect of the embossing process on the nanopore structure in the glass. Using a combination of techniques to measure the distribution of nanopores in the insulator material, they found that the NIL embossing process actually has a beneficial effect--it increases the population of small pores, which improve performance, reduces the population of larger pores that can cause problems and creates a thin, dense protective skin across the surface of the material. All of these effects are highly attractive for minimizing short circuits in semiconductor devices.

Taken together, the two papers suggest that nanoimprint lithography can produce superior nanoporous insulator layers in advanced semiconductor devices with significantly fewer--and easier--processing steps than conventional lithography.

* "Spin-on organosilicate glass"

** H.W. Ro, R.L. Jones, H. Peng, D.R. Hines, H-J. Lee, E.K. Lin, A. Karim, D.Y. Yoon, D.W. Gidley and C.L. Soles. The direct patterning of nanoporous interlayer dielectric insulator films by nanoimprint lithography. Advanced Materials. 2007, 19, 2919--2924.

*** H.W. Ro, H. Peng, K.-i. Niihara, H.-J. Lee, E.K. Lin, A. Karim, D.W. Gidley, H. Jinnai, D.Y. Yoon and C.L. Soles. Self-sealing of nanoporous low dielectric constant patterns fabricated by nanoimprint lithography. Advanced Materials 2008, Early View: April 15, 2008.


Story Source:

The above story is based on materials provided by National Institute of Standards and Technology. Note: Materials may be edited for content and length.


Cite This Page:

National Institute of Standards and Technology. "Making A Good Impression: Nanoimprint Lithography Tests." ScienceDaily. ScienceDaily, 2 May 2008. <www.sciencedaily.com/releases/2008/04/080429170958.htm>.
National Institute of Standards and Technology. (2008, May 2). Making A Good Impression: Nanoimprint Lithography Tests. ScienceDaily. Retrieved April 1, 2015 from www.sciencedaily.com/releases/2008/04/080429170958.htm
National Institute of Standards and Technology. "Making A Good Impression: Nanoimprint Lithography Tests." ScienceDaily. www.sciencedaily.com/releases/2008/04/080429170958.htm (accessed April 1, 2015).

Share This


More From ScienceDaily



More Matter & Energy News

Wednesday, April 1, 2015

Featured Research

from universities, journals, and other organizations


Featured Videos

from AP, Reuters, AFP, and other news services

7-Year-Old Girl Gets 3-D Printed 'robohand'

7-Year-Old Girl Gets 3-D Printed 'robohand'

AP (Mar. 31, 2015) Although she never had much interest in prosthetic limbs before, Faith Lennox couldn&apos;t wait to slip on her new robohand. The 7-year-old, who lost part of her left arm when she was a baby, grabbed it as soon as it came off a 3-D printer. (March 31) Video provided by AP
Powered by NewsLook.com
Dutch Architects Show Off 3D House-Building Prowess

Dutch Architects Show Off 3D House-Building Prowess

Reuters - Innovations Video Online (Mar. 31, 2015) Dutch architects are constructing a 3D-printed canal-side home, which they hope will spark an environmental revolution in the house-building industry. Jim Drury reports. Video provided by Reuters
Powered by NewsLook.com
Solar Plane Stops in China

Solar Plane Stops in China

Reuters - News Video Online (Mar. 31, 2015) Solar Impulse 2 stops over in China&apos;s Chonqing, completing the fifth leg in its bid to become the first solar powered plane to travel around the globe. Rough Cut (no reporter narration). Video provided by Reuters
Powered by NewsLook.com
Solar Impulse Lands in China After 20-Hour Flight from Myanmar

Solar Impulse Lands in China After 20-Hour Flight from Myanmar

AFP (Mar. 31, 2015) Solar Impulse 2 lands in China, the world&apos;s biggest carbon emitter, completing the fifth leg of its landmark global circumnavigation powered solely by the sun. Duration: 00:55 Video provided by AFP
Powered by NewsLook.com

Search ScienceDaily

Number of stories in archives: 140,361

Find with keyword(s):
Enter a keyword or phrase to search ScienceDaily for related topics and research stories.

Save/Print:
Share:

Breaking News:

Strange & Offbeat Stories


Space & Time

Matter & Energy

Computers & Math

In Other News

... from NewsDaily.com

Science News

Health News

Environment News

Technology News



Save/Print:
Share:

Free Subscriptions


Get the latest science news with ScienceDaily's free email newsletters, updated daily and weekly. Or view hourly updated newsfeeds in your RSS reader:

Get Social & Mobile


Keep up to date with the latest news from ScienceDaily via social networks and mobile apps:

Have Feedback?


Tell us what you think of ScienceDaily -- we welcome both positive and negative comments. Have any problems using the site? Questions?
Mobile: iPhone Android Web
Follow: Facebook Twitter Google+
Subscribe: RSS Feeds Email Newsletters
Latest Headlines Health & Medicine Mind & Brain Space & Time Matter & Energy Computers & Math Plants & Animals Earth & Climate Fossils & Ruins