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ShareSep. 29, 2011 — UC Davis scientists have developed a self-cleaning cotton fabric that can kill bacteria and break down toxic chemicals such as pesticide residues when exposed to light.
"The new fabric has potential applications in biological and chemical protective clothing for health care, food processing and farmworkers, as well as military personnel," said Ning Liu, who conducted the work as a doctoral student in Professor Gang Sun's group in the UC Davis Division of Textiles of Clothing.
A paper describing the work was published Sept. 1 in the Journal of Materials Chemistry.
Liu developed a method to incorporate a compound known as 2-anthraquinone carboxylic acid, or 2-AQC, into cotton fabrics. This chemical bonds strongly to the cellulose in cotton, making it difficult to wash off, unlike current self-cleaning agents. Unlike some other experimental agents that have been applied to cotton, it does not affect the properties of the fabric.
When exposed to light, 2-AQC produces so-called reactive oxygen species, such as hydroxyl radicals and hydrogen peroxide, which kill bacteria and break down organic compounds such as pesticides and other toxins.
Although 2-AQC is more expensive than other compounds, the researchers say that cheaper equivalents are available.
The work was funded by the National Science Foundation, the U.S. Defense Threat Reduction Agency and the Jastro Shields Graduate Research Fellowship from the UC Davis College of Agricultural and Environmental Sciences.
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The above story is reprinted from materials provided by University of California - Davis.
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Journal Reference:
- Ning Liu, Gang Sun, Jing Zhu. Photo-induced self-cleaning functions on 2-anthraquinone carboxylic acid treated cotton fabrics. Journal of Materials Chemistry, 2011; 21 (39): 15383 DOI: 10.1039/C1JM12805A
Note: If no author is given, the source is cited instead.
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